Department of Electrical and Computer Engineering University of Wisconsin - Madison Computer Engineering Seminar (Spring 2007-2008)

 

        Speaker:    Professor Franco Cerrina
        Time:       12:00 Noon  
        Date:       April 11, 2008   
        Location:   Room 4610, Engineering Hall  

        Subject:    Advances in Lithography and the Future of Scaling


As usual soft drinks will be available for those who show up in
time for the seminar. 

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               Advances in Lithography and the Future of Scaling
   

                                       by
                             Professor Franco Cerrina 
                   Deptartment of Electrical & Computer Engrineering
                           University of Wisconsin-Madison
                               Madison, WI 53706-1691. 
      

Abstract:

We will review the current status of lithography for CMOS  manufacturing, 
and discuss the problems facing continuing scaling. The  
use of i193 nm ArF (immersion) opens new possibilities, and it is  
likely to be extended to 32 and even 22 nm CD. But even with advanced  
Resolution Enhancement Techniques (RET) there will be a limit to  optical 
lithography, and it is likely to happen at the 22-15 nm node.  
Alternatives, such as Extreme Ultraviolet Lithography, are complex and  
late in deployment; electron beam techniques are not ready yet. 
We  will review the issues connected with litho and design, 
specifically  in DFM problems.


Biography: 

Franco Cerrina is Lynn H. Matthias Professor of Electrical and Computer Engineering at the 
University of Wisconsin-Madison.  He is an IEEE, APS and OSA Fellow, recipient of the SRC 
Aristotle award, and the director of the Center for Nano Technology since 1988.  
He earned his Doctorate in Physics from the University of Rome in 1974 and joined 
the University of Wisconsin’s ECE Department in 1984.  Since then, 23 Ph.D. students have 
graduated from his group. Over the years, he has procured and managed in excess of $45 millions in 
grants and research contracts. He has authored over 250 papers, and holds several patents.

His research work is centered on semiconductor fabrication, optical patterning and advanced 
lithography. Multidisciplinary in nature, this activity is strongly physics-based, and involves both 
experimental and computer modeling approaches. It is applied to the development of novel 
technologies, and to their use in real-world engineering problems. 

Recently he has expanded his research to include the application of microfabrication techniques 
to biological and genomic problems, ranging from DNA Microarrays, to DNA de-novo synthesis 
and to the use of DNA in nanofabrication. In the genomics area he has developed a novel Maskless 
photolithographic method for the rapid synthesis of DNA microarray chips (MAS). 

He has managed the Center for Nanotechnology (CNTech) since 1988. The activity at CNTech focuses 
on the development of novel patterning techniques at the micro and nano levels, with application 
to semiconductor processing as well as to biological systems. The Center is an interdisciplinary 
research unit of the College of Engineering. More than 20 students and researchers use the Center’s 
resources at any given time. Under the direction of F. Cerrina, CNTech has become an internationally 
known research organization in the area of advanced semiconductor lithography and nanofabrication.

CNTech’s nanolithography activity is concentrated on Next Generation Lithography (NGL) development, 
with strong industrial partnerships. The biological activities focus on genomics problems.