Background; Comparison of model with experimental data |
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BACKGROUND
The contact compliance (1/stiffness) for an indenter with a specimen is
(1)
where A is the projected area of the indent and nd and Ed are Poisson's ratio and Young's modulus of the diamond indenter (0.07 and 1137 GPa). Er is the property of the specimen and depends on the size of the indent in relation to the film thickness. b (beta) is a numerical factor that depends on indenter geometry. It varies a little, and different researchers use different values. Most researchers use b = 1.128 which is consistent with a flat, circular punch. In earlier simulations we employed b = 1.086 corresponding to uniform pressure over a triangular region. More recently we have gone to b = 1.23 based on experimental measurements and finite element analysis simulations [1]. The new value is substantially larger than the old; yet both values were adequate for fitting experimental data. The reason for this apparent discrepancy is that in the previous studies where b = 1.086 was used a different way of measure unloading compliance was also used based on Doerner and Nix [2]. The older way of calculating compliance tended to overestimate the compliance in a way that cancels out the effect of using a lower b value. (Some of the errors did not cancel out: we always obtained a high value for the Youn'g modulus of silicon). These days we determine compliance (contact stiffness) from experimental data in a way that is similar to Oliver-Pharr method [3], and based on this obtain b ~ 1.23.
The product bEr is calculated from by the simulations using elasticity theory and methods described in reference [4].
In the simulation files, the value of b being used is 1.086. To correct this for our new way of analyzing data we multiply compliance calculated from the model by (1.086/1.23) and effective modulus by (1.23/1.086). Most researchers would use the numerical factor (1.128/1.086).
In the simulations the effects of the diamond indenter are already taken into account.
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DIFFERENT WAYS OF COMPARING MODEL SIMULATIONS WITH EXPERIMENTAL DATA
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hC vs. h/A1/2. This is a good way of comparing model with experimental data when you know what the areas of the indents are. Be warned, though: the areas determined by the instrument are based on depth, and they aren't always very accurate; accurate area measurement is tedious and requires some experience. This method is good for identifying whether you have properly removed the machine compliance from your data, because an unaccounted for machine compliance will come out as an intercept on the hC axis. Columns 1 and 2 are hC vs. h/A1/2, respectively. Depending on what you use for b, you should multiply hC from the simulation by (1.086/b) before comparing it with your data.
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Eeff vs A1/2/h. This offers perhaps the most sensitive comparison between data and theory, but it is also the most likely to suffer from any errors in the data. Be warned: the areas determined by the instrument are based on depth, and they aren't always very accurate; accurate area measurement is often tedious and requires some experience.
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CP1/2 vs. P1/2/h from the experimental data with (HA)1/2C vs. (HA)1/2/h where H, the hardness of the film, is used as a fitting parameter. This offers the most robust comparison because it does not rely on having to measure the area. For poly crystalline films the hardness is constant throughout some range of load, so this comparison works remarkably well.
REFERENCES
- 1. Jakes, J.E., C.R. Frihart, J.F. Beecher, R.J. Moon, and D.S. Stone, Experimental method to account for structural compliance in nanoindentation measurements. Journal of Materials Research, 2008. 23(4): p. 1113-1127.
- Doerner, M.F. and W.D. Nix, A method for interpreting the data from depth-sensing indentation instruments. Journal of Materials Research, 1986. 1(4): p. 601-9.
- Oliver, W.C. and G.M. Pharr, Improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments. Journal of Materials Research, 1992. 7(6): p. 1564-1580.
- Stone, D.S., Elastic rebound between an indenter and a layered specimen. I. Model. Journal of Materials Research, 1998. 13(11): p. 3207-13.
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Comparison between our model and rigid punch model of King (Int. Journal of Solids and Structures, 1987. 23(12): p. 1657-64.)
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D. Stone, T. W. Wu, P.-S. Alexopoulos, and W. R. LaFontaine, "Indentation Technique to Investigate Elastic Moduli of Thin Films", Mater. Res. Soc. Symp. Proc. 130 J. C. Bravman, D. M. Barnett, W. D. Nix, and D. A. Smith, Eds. MRS (1989) 105-110.
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Films on top of Si
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D. Stone, T. W. Wu, P.-S. Alexopoulos, and W. R. LaFontaine, "Indentation Technique to Investigate Elastic Moduli of Thin Films", Mater. Res. Soc. Symp. Proc. 130 J. C. Bravman, D. M. Barnett, W. D. Nix, and D. A. Smith, Eds. MRS (1989) 105-110. |
0.25 mm TiN film on 440C stainless steel substrate I:
hC vs h/A1/2
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D. S. Stone, K. B. Yoder, and W. D. Sproul, Hardness and Elastic Modulus of TiN Based on Continuous Indentation Technique and New Correlation. Journal of Vacuum Science and Technology A , 9(4) July/August (1991) 2543-2547. |
TiN film on 440C stainless steel substrate II:
CP1/2 vs. P1/2/h gives hardness of the film ~ 32 GPa.
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D. S. Stone, K. B. Yoder, and W. D. Sproul, Hardness and Elastic Modulus of TiN Based on Continuous Indentation Technique and New Correlation. Journal of Vacuum Science and Technology A , 9(4) July/August (1991) 2543-2547. |
Aluminum-Tungsten multilayers, modeled as transversely isotropic layer, on Silicon
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(nanoindentation able to detect composition of composites based on modulus measurement) 
M.F. Tambwe, D.S. Stone, J.-P. Hirvonen, I. Suni, and S.-P. Hannula. Nanoindentation as a Composition Microprobe for Nanolayer Composites, Scripta Materialia, 37, November (1997) 1421-1427. |
Silicon on Insulator (SOI) I
CP1/2 vs. P1/2/h
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J.E. Jakes, C.R. Frihart, J.F. Beecher, R.J. Moon, P.J. Resto, Z.H. Melgarejo, O.M. Suárez, H. Baumgart, A.A. Elmustafa, and D.S. Stone. Nanoindentation near the edge, Journal of Materials Research 29(3), March 2009, pp. 1016-1031. |
Cu/Nb nanolayer composites on Si substrate
Eeff vs A1/2/h
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Tambwe, M.F., D.S. Stone, A.J. Griffin, H. Kung, Y.C. Lu, and M. Nastasi, Haasen plot analysis of the Hall-Petch effect in Cu-Nb nanolayer composites. Journal of Materials Research, 1999. 14(2): p. 407-17.
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Silicon on Insulator (SOI) II
Eeff vs A1/2
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 J.E. Jakes, C.R. Frihart, J.F. Beecher, R.J. Moon, P.J. Resto, Z.H. Melgarejo, O.M. Suárez, H. Baumgart, A.A. Elmustafa, and D.S. Stone. Nanoindentation near the edge, Journal of Materials Research 29(3), March 2009, pp. 1016-1031. |
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